论文部分内容阅读
Ir是一种重要的真空紫外反射材料,在太阳物理、宇宙物理、生命科学、大气物理、同步辐射等方面有着十分重要的应用。对电子束蒸发沉积Ir膜在真空紫外波段的反射特性进行了系统的理论和实验研究。根据吸收材料基底上单层金属膜数学计算模型,对不同基片上各种厚度的Ir膜真空紫外反射率进行了优化计算。根据计算和前期实验结果,采用电子束蒸发方法,在石英、K9玻璃基片上沉积了不同厚度的Ir膜,在入射波长120 nm处获得了近30%正入射反射率,对应的Ir膜厚度为12 nm。过厚或过薄均不利于Ir膜反射率的提高。经退火处理后,Ir膜中张应力有所释放但并未消除,同时晶粒平均尺寸显著增大,反射率下降。
Ir is an important vacuum UV reflective material, which has very important applications in solar physics, cosmic physics, life science, atmospheric physics and synchrotron radiation. The theoretical and experimental studies on the reflection characteristics of electron beam deposited Ir film in the vacuum ultraviolet region were systematically carried out. Based on the mathematical model of single layer metal film on the substrate, the vacuum ultraviolet reflectance of Ir films with different thicknesses was optimized. According to the calculation and previous experimental results, different thickness Ir films were deposited on quartz and K9 glass substrates by electron beam evaporation, and nearly 30% positive incident reflectivity was obtained at the incident wavelength of 120 nm. The corresponding Ir film thickness was 12 nm. Too thick or too thin are not conducive to the improvement of Ir film reflectivity. After annealed, the tensile stress of Ir film was released but not eliminated, meanwhile the average grain size increased significantly and the reflectivity decreased.