采用 XRD和 HREM技术研究了多靶磁控溅射法制备的 W/Si C纳米多层膜的微结构 .结果表明 ,在多层膜中 ,Si C调制层为非晶态 ;W调制层在大调制周期时为纳米晶 ,随调制周期减小逐渐转变为非晶态 .W/Si C纳米多层膜的调制结构界面平直、清晰、周期性好 ,而在原子尺度上 ,界面存在一个成分混合和结构调整的过渡区 The microstructures of W / Si C multilayered films prepared by multi-target magnetron sputtering were investigated by XRD and HREM techniques. The results show that in the multi-layer films, the Si C modulation layers are amorphous; When the modulation cycle is nanocrystal, it gradually changes to amorphous state as the modulation period decreases.The modulation structure interface of W / Si C nano-multilayer film is flat, clear and good periodicity, while on the atomic scale, there is one Blending and blending of components