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用对向靶溅射制备NiCr－NiSi薄膜热电偶，实现了薄膜成分与靶材基本一致。对热电偶进行动态特性测试表明，薄膜热电偶的时间常数τ随膜厚变薄而减小，并对此进行讨论。
The NiCr-NiSi thin film thermocouple was prepared by the opposite target sputtering to achieve the same film composition and target. The dynamic characteristics of the thermocouple test showed that the thin film thermocouple time constant τ decreases with the film thickness decreases, and to discuss this.