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用扫描电子显微镜(SEM)对集成电路芯片截面进行了分析,介绍了芯片截面的制备方法、结构显示和SEM观察技术,并对集成电路中一些重要的制造工艺进行了分析,得到了用其他方法较难得到的重要的器件几何参数。
The cross sections of ICs were analyzed by scanning electron microscopy (SEM). The fabrication methods, structure display and SEM observation of the cross sections of the ICs were introduced. Some important manufacturing processes in ICs were also analyzed. Difficult to get important device geometry.