本文报告了采用微波等离子体进行化学气相沉积氮化钛(TiN)的工作。文中讨论了微波等离子体的动力学效应和热力学效应并阐述了氢在等离子体化学气相沉积(PCVD)TiN反应中的作用。 This paper reports the work of chemical vapor deposition of titanium nitride (TiN) using microwave plasma. In this paper, the kinetic and thermodynamic effects of microwave plasma are discussed and the role of hydrogen in the TiN reaction of plasma-enhanced chemical vapor deposition (PCVD) is also discussed.