描述 30 8nm和 193nm波长准分子激光对 PI、PC和 PMMA三种聚合物的微刻蚀实验 ,并从刻蚀表面光洁度、边缘锐利和垂直度、刻蚀阈值等方面对刻蚀特性进行了讨论和比较。其中 30 8nm激光对 PC和 PMMA刻蚀性能很差 ,而 193nm激光刻蚀 PI和 PC,以及 30 8nm激光刻蚀 PI都能达到微米级横向分辨率和亚微米级深度精度 ,通过这种方法成功地刻蚀出了二阶位相光栅。 The micro-etching experiments of three polymers PI, PC and PMMA at 30nm and 193nm wavelength excimer laser were described and the etching properties were also discussed in terms of etching surface finish, edge sharpness and verticality, etching threshold and so on And compare. Among them, the 30 8 nm laser has poor etching performance on PC and PMMA, while 193 nm laser etching of PI and PC, and 30 8 nm laser etching of PI can achieve micron-level lateral resolution and sub-micron depth precision. By this method, The second order phase grating is etched.