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本文提出了一种新的CVD金刚石膜抛光技术。采用该项技术 ,可以高效率的完成CVD金刚石膜的粗抛光。CVD金刚石膜表面被预先涂覆一层导电金属 ,然后采用电蚀方法对该表面进行加工 ,使金刚石膜突起的尖峰被迅速去除。加工中金刚石表面的石墨化使电蚀加工得以不断延续。通过单脉冲放电试验已经发现涂覆层的材料对金刚石膜的加工效果有很大影响。与普通金属加工相比 ,金刚石膜的电蚀过程有其完全不同的特征。通过试验和分析 ,本文还对金刚石膜的电蚀去除机理进行了初步探讨
This paper presents a new CVD diamond film polishing technique. The use of this technology, you can efficiently complete the rough CVD diamond film polishing. CVD diamond film surface is pre-coated with a layer of conductive metal, and then use the electric erosion of the surface of the processing, so that the sharp diamond film is rapidly removed. Graphitization of the diamond surface during machining allows continuous galvanic processing. It has been found through the single pulse discharge test that the material of the coating layer has a great influence on the processing effect of the diamond film. Compared with the ordinary metal processing, the erosion process of diamond film has its completely different characteristics. Through the experiment and analysis, the erasing mechanism of diamond film is also discussed