研究了磁控溅射工艺中溅射功率对制备Fe-Ga薄膜的影响,对薄膜进行了热处理以及硬度测试。结果发现,在50~100 W,薄膜厚度随溅射功率的增大而增加,并且在100 W时所得的薄膜厚度和致密性最佳。热处理后发现薄膜变得更致密、更均匀。在一定功率范围内,薄膜的硬度也随溅射功率的增加而增加。 The influence of sputtering power on the preparation of Fe-Ga thin films was studied. The thin films were heat-treated and hardness tested. The results show that at 50-100 W, the film thickness increases with the sputtering power, and the film thickness and densification obtained at 100 W are the best. The films were found to be denser and more uniform after heat treatment. In a certain range of power, the film hardness also increases with the increase of sputtering power.