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为探讨磁盘片表面NiP涂层在颗粒冲击过程中的碰撞损伤及与冲蚀时间的关系,利用高分辨透射电镜、原子力显微镜、X射线光电子能谱仪和俄歇电子能谱仪等考察计算机硬磁盘基片表面NiP涂层经含SiO2纳米颗粒抛光液冲击后发生的微观物理变化。结果表明:经纳米颗粒碰撞后的计算机硬磁盘基片表面NiP涂层损伤随碰撞时间明显变化,在经颗粒碰撞后的表面上可观测到颗粒嵌入、纳米尺度的凹坑和划痕;NiP涂层表面在碰撞过程中发生氧化,氧化程度随时间延长而加剧。经3min抛光液冲击后,在表面以下大约6nm深度可观测到P元素的聚集,在涂层的亚表面可观测到纳米尺度的晶粒,晶粒的尺寸受冲击时间的影响。
In order to investigate the impact damage of NiP coating on the surface of the disk and its relation with the erosion time, the effects of NiP coating on the hard disk of computer were investigated by high resolution transmission electron microscopy, atomic force microscopy, X-ray photoelectron spectroscopy and Auger electron spectroscopy. Microscopic Physical Changes of NiP Coating on Substrate Surface after Impacted by Silica Nanoparticles Polishing Fluid. The results show that the damage of NiP coating on the surface of computer hard disk substrate after the collision of nano-particles obviously changes with the collision time, and the embedding of nano-scale pits and scratches can be observed on the surface after particle collision. The surface is oxidized during the collision, and the degree of oxidation aggravates with time. After 3 minutes polishing, the P element can be observed at the depth of about 6 nm below the surface. At the sub-surface of the coating, nanoscale grains can be observed. The size of the grains is affected by the impact time.