为了将平面金属膜紧密耦合到纳米光栅形成的表面等离子体共振传感器,以提高灵敏度,以及利用亚微米光栅调整共振反射波长,需要制备亚微米结构光栅。介绍了一种基于X光光刻的亚微米结构光栅的制造技术。该结构光栅是利用日本立命馆大学的同步辐射光源进行同步辐射光光刻,在有机玻璃(PMMA)板上直接得到亚微米光栅。用此纳米加工技术获得的光栅线宽为250 nm,周期为500 nm,深宽比为8的PMMA亚微米结构光栅。还优化了曝光近接间隔、曝光剂量和显影时间等同步辐射光刻参数。 To tightly couple a planar metal film to a nano-grated surface plasmon resonance sensor for increased sensitivity and sub-micron gratings to adjust the resonant reflection wavelength, sub-micron structured gratings have to be prepared. A manufacturing technology of submicron grating based on X-ray lithography is introduced. The structure of the grating is the use of synchrotron radiation photon source of Ritsumeikan University for synchrotron radiation photolithography, submicron grating directly on the plexiglass (PMMA) plate. The nanowire fabricated PMMA submicron gratings with grating linewidth of 250 nm, period of 500 nm and aspect ratio of 8 were obtained. Synchrotron radiation lithography parameters such as exposure proximity interval, exposure dose, and development time are also optimized.