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设计了一种新工艺———利用硅微结构直接作为模具来制作微小固体染料激光器谐振腔型滤波器。首先通过组合刻蚀工艺制作硅模具 ,再利用硅模具复制得到微谐振腔。组合刻蚀工艺是采用深层反应离子刻蚀 (deep RIE)再结合EPW湿法刻蚀 (一种各向异性刻蚀技术 )。由于EPW湿法刻蚀对〈110〉面刻蚀速率较慢 ,可制作出具有光学镜面的侧壁〈110〉的硅模具 ,利用此模具可复制出正方形固态染料微谐振腔。以激光染料若丹明 6G掺杂的聚甲基丙烯酸甲脂 (PMMA)为工作物质 ,在调QNd∶YAG自倍频激光 5 32nm抽运下 ,得到 6 0 0nm波长的激光输出。这种谐振腔可应用在染料激光器和滤波器中 ,对其原理、设计、制作工艺和性能都作了介绍。
A new technique was designed to make micro-solid-state dye laser cavity resonator filter directly by using silicon micro-structure as a mold. Firstly, a silicon mold is fabricated by a combined etching process, and then the microresonator is obtained by using a silicon mold. The combined etching process uses deep RIE combined with EPW wet etching (an anisotropic etching technique). Due to the slow etch rate of the <110> plane by the EPW wet etch, a silicon mold with optically mirrored sidewall <110> can be fabricated, with which a square solid dye microresonator can be replicated. Using laser dye Rhodamine 6G doped polymethylmethacrylate (PMMA) as the working material, a laser with a wavelength of 600 nm was obtained after pumping QNd: YAG self-doubling laser at 532 nm. This resonator can be used in dye lasers and filters, the principle, design, manufacturing process and performance are described.