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通过调控氮氧比采用反应磁控溅射沉积技术在硅基表面制备AlOxNy涂层.利用X射线衍射仪(XRD)、扫描电子显微镜(SEM)、X射线光电能谱仪(XPS)、投射电子显微镜(TEM)、光谱椭偏仪(SE)分析氮氧比对所制备AlOxNy涂层微观结构及光学性质的影响.结果表明,通过调控AlOxNy涂层的氮氧含量,该涂层的光学性质由半导体特性向电介质特性转变,折射率介于1.63~1.91之间,说明AlOxNy涂层具有可调控的光学常数,可作太阳能选择性吸收涂层增透层的候选材料.“,”AlOxNycoatings on the silicon surface were prepared by reactive magnetron sputtering deposition technology and controlling the ratio of nitrogen and oxygen. The microstructure and optical properties were investigated by X-ray diffraction(XRD),scanning electron microscopy(SEM),X-ray photoelectron spectroscopy(XPS),transmission electron microscopy(TEM)and spectroscopic ellipsometry(SE). The results showed that through controlling nitrogen and oxygen content in AlOxNycoatings,the optical properties of the coating shift from semiconductor to dielectric properties,and the refractive index is between 1.63 and 1.91. This indicates that the AlOxNycoatings have tunable optical constants,can be one of the candidate materials for AR coating of solar selective absorbing coatings.