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利用质量分离的低能离子束技术 ,获得了Fe组分渐变的Fe Si薄膜。利用俄歇电子能谱法 (AES)、X射线衍射法 (XRD)以及X射线光电子能谱法 (XPS)测试了薄膜的组分、结构特性。测试结果表明 ,在室温下制备的Fe Si薄膜呈非晶态。非晶薄膜在 40 0℃下退火 2 0min后晶化 ,没有Fe的硅化物相形成。退火后Fe Si薄膜的Fe组分从表面向内部逐渐降低。
Fe mass fractionated low-energy ion beam technique was used to obtain Fe-graded Fe-Si films. The composition and structural characteristics of the films were tested by Auger electron spectroscopy (AES), X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS). The test results show that Fe Si films prepared at room temperature are amorphous. The amorphous film was annealed at 40 ℃ for 20min and crystallized without silicide phase. After annealing, the Fe composition of the Fe Si film gradually decreases from the surface to the interior.