扫描干涉场曝光(SBIL)系统中曝光效果与工件台的运动性能密切相关。为了制作纳米精度的大面积平面光栅,工件台采用了粗微叠层结构设计,其中微动台是实现工件台运动精度的关键。基于SBIL原理,推导了干涉条纹周期测量精度与曝光对比度的关系。针对移动分光镜测量干涉条纹周期的方法,结合周期测量精度需求,分析了微动台定位精度指标,提出了实现微动台x、y、θz三个自由度定位精度的控制器设计方法,并在微动台系统上进行了实验验证。结果表明,微动台x方向定位精度可达±1.51nm,y方向定位精度可达±5.46nm,θz定位精度可达±0.02μrad,可以满足SBIL的需求和干涉条纹周期测量的精度要求。 The exposure effect in the scanning interference field exposure (SBIL) system is closely related to the movement performance of the workpiece stage. In order to fabricate a large-area planar grating with a nano-precision, the workpiece stage adopts a rough micro-laminated structure design, in which the micro-moving stage is the key to achieve the precision of the workpiece stage. Based on the principle of SBIL, the relationship between the interference fringe period measurement accuracy and the exposure contrast was deduced. Aiming at the method of measuring the interference fringe period by moving beam splitter, combined with the demand of periodic measurement accuracy, the index of positioning accuracy of the micro-moving table is analyzed. The controller design method of three DOF positioning accuracy of micro-moving table is put forward. Experiments were carried out on the micro-controller system. The results show that the positioning accuracy of XY stage can reach ± ​​1.51nm, the positioning accuracy can reach ± ​​5.46nm in y direction, and the positioning accuracy of θz can reach ± ​​0.02μrad, which can meet the demand of SBIL and the accuracy of periodic measurement of interference fringes.