【摘 要】
：
A plasma source utilizing direct current (DC) voltage between an anode and a hot hollow cathode is employed to create high-density plasma. Plasma spatial distribution, ion energy, plasma neutralisation, and current densities are found to be separately tun
【机 构】
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ThinFilmCentre,UniversityoftheWestofScotlandPaisley,Paisley,PA12BE,ScotlandThinFilmSolutionsLtd.,Blo
【出 处】
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ChineseOpticsLetters
论文部分内容阅读
A plasma source utilizing direct current (DC) voltage between an anode and a hot hollow cathode is employed to create high-density plasma. Plasma spatial distribution, ion energy, plasma neutralisation, and current densities are found to be separately tunable. Ion current densities
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