以钴离子为模板离子,硅胶为基底,(3-巯基丙基)三甲氧基硅烷为功能单体,环氧氯丙烷为交联剂,采用表面印迹技术制备并表征了钴离子印迹聚合物[Co(Ⅱ)-IIP],研究了其对钴离子的吸附性能。结果表明,在25℃、pH=5~6时平衡吸附时间为1h,最大吸附量为20.05mg/g。Co(Ⅱ)-IIP对Co(Ⅱ)/Cd(Ⅱ)、Co(Ⅱ)/Pb(Ⅱ)、Co(Ⅱ)/Cu(Ⅱ)、Co(Ⅱ)/Ni(Ⅱ)吸附选择性系数分别为2.52、1.34、3.61、4.39。经5次吸附-解吸循环后,Co(Ⅱ)-IIP对钴离子的吸附效果并没有明显下降,表明该材料具有一定的循环利用性能。 Cobalt ion imprinted polymer was prepared and characterized by using cobalt ion as template ion, silica gel as substrate, (3-mercaptopropyl) trimethoxysilane as functional monomer and epichlorohydrin as crosslinking agent [ Co (Ⅱ) -IIP], its adsorption of cobalt ions was studied. The results showed that the equilibrium adsorption time was 1 h and the maximum adsorption capacity was 20.05 mg / g at pH = 5 ~ 6 at 25 ℃. Selectivity Co (Ⅱ) / Co (Ⅱ) / Co (Ⅱ) / Co (Ⅱ) / Co Respectively 2.52,1.34,3.61,4.39. After 5 cycles of adsorption-desorption, the adsorption of Co (Ⅱ) -IIP on cobalt ions did not decrease obviously, indicating that the material has certain recycling performance.