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钠钙玻璃基片上的ＳｉＯ２膜层在很大程度上决定了液晶显示器件（ＬＣＤ）的化学稳定性及使用寿命。本文以射频溅射法制备的ＳｉＯ２膜层为样品，结合ＬＣＤ工艺特点，初步研究分析了其工艺流程中所使用的不同碱性溶液对ＳｉＯ２膜层不同的刻蚀作用。本文的结论有利于在ＬＣＤ工艺中更好地保护ＳｉＯ２膜层。
The SiO2 film on soda-lime glass substrate largely determines the chemical stability and service life of liquid crystal display (LCD). In this paper, the SiO2 film prepared by radio frequency sputtering method is taken as a sample. Based on the characteristics of the LCD process, the different etching effects of different alkaline solutions on the SiO2 film are analyzed. The conclusion of this paper is to help better protect the SiO2 film in the LCD process.