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提出一种误差预补偿的方法,调整引起的掩模特征形状以实现光罩图形的轮廓调制,通过数据前期的预补偿,减少失真,从而改善微细直角的最终光刻制作结果。
A method of error precompensation is proposed, which adjusts the shape and shape of the mask to adjust the profile of the reticle. Through the pre - compensation of the data, it can reduce the distortion and improve the result of final lithography.