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采用溶胶-凝胶法在普通玻璃基底上制备了Al3+掺杂的TiO2薄膜,采用X射线粉末衍射仪(XRD)、场发射扫描电镜(FE-SEM)和紫外-可见分光光度计,分析了Al3+掺杂量对TiO2薄膜的微结构、表面形貌以及染料吸附特性的影响。结果表明:Al3+的掺杂能够抑制TiO2晶粒的生长,提高薄膜表面均匀度;但是Al3+含量过高,会造成当TiO2薄膜对染料的吸附量减小时,吸光度降低。因此,Al3+的掺杂量在TiO2摩尔量的1%左右时,薄膜具有较好的多孔结构和染料吸附量。
Al3 + doped TiO2 thin films were prepared on common glass substrate by sol-gel method. The effects of Al3 + concentration on the photocatalytic activity of Al3 + doped TiO2 thin films were investigated by X-ray powder diffraction, field emission scanning electron microscope and UV-visible spectrophotometer. Effect of Doping Amount on Microstructure, Surface Morphology and Dye Adsorption Characteristics of TiO2 Thin Films. The results show that the doping of Al3 + can inhibit the growth of TiO2 grains and improve the uniformity of the surface of the film. However, if the content of Al3 + is too high, the absorbance will decrease when the adsorption amount of TiO2 film decreases. Therefore, the doping amount of Al3 + is about 1% of the molar amount of TiO2, the film has better porous structure and dye adsorption capacity.