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高功率脉冲磁控溅射(HPPMS)因其高离化率而得到广泛关注。高压大电流脉冲电源是实现该技术的重要环节之一。本论文介绍了一种HPPMS电源,该电源由充电电源、斩波输出两部分组成,给出了主电路框图。分析了大电流对斩波开关过电压的影响,采用RC吸收和续流有效地抑制了电压过冲,用所研制的电源进行HPPMS镀膜试验,结果表明电源运行稳定可靠,制备的薄膜表面清洁、致密,其平均表面粗糙度很低。可以预见HPPMS技术将会促进镀膜技术的发展。
High-power pulsed magnetron sputtering (HPPMS) has gained wide attention due to its high rate of ionization. High-voltage high-current pulsed power supply is one of the important steps to achieve this technology. This paper introduces a HPPMS power supply, the power from the charging power supply, chopper output of two parts, gives the main circuit diagram. The influence of high current on the over-voltage of the chopper switch was analyzed. The voltage overshoot was effectively suppressed by RC absorption and freewheeling. The HPPMS coating test was carried out with the developed power supply. The results showed that the power supply was stable and reliable, the prepared film surface was clean, Dense, the average surface roughness is very low. It is foreseeable that HPPMS technology will promote the development of coating technology.